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APPLY NOW for Eyebeam Residencies and Fellowships. Open Call deadline is June 14.
APPLICATION DEADLINE: All applications must have been received via online application by 12:00PM (noon), Monday, November 26, 2012. All applicants will be informed of their application status by January 29, 2013.
RESIDENCY BEGINS: MID-MARCH 2013
EYEBEAM VALUES: Critical questioning of the status quo and a belief in progress are core values of Eyebeam. This has been demonstrated through 15 years of experimentation via creative use and misuse of technology with the goal to innovate and develop better relationships between people and tools. This approach results both in the development of creative platforms and exciting works of art (recent examples: Computational Fashion, Zajal, RGBD Toolkit, Street Ghosts, Dead Drops, and Flock House).
Eyebeam believes that all creative work begins with a commitment to sustainability, equality, diversity, and concern for a better future. Across all research initiatives and focus areas, Eyebeam primarily supports projects that have real-world impact -- Eyebeam maintains that cultural progress is possible and encourages work that is paradigm shifting within a large spectrum of genres. In 2013, Eyebeam will continue to focus on work that involves community-interdependence and resourcefulness, learning, curiosity, and creative exploration.
OVERVIEW: Acceptance into the residency program is based on the quality and visionary potential of a project proposal. Applicants are also expected to show demonstrable success in previous development of related projects at this scale. Residents are granted a $5,000 stipend and 24/7 access to Eyebeam's design and fabrication studios at our Chelsea facility to realize the project. A full timeline of your project including up to 3 milestones you’ll need to hit for completion of the project and how staff can assist in this will be expected shortly after acceptance into the program. Additionally, a staff advisor will be assigned to assist in meeting milestones and with the project’s successful completion.
Up to six Residents will be selected for the upcoming 5-month cycle, which will run from mid-March, 2013 to mid-August, 2013.
SUPPORT: Eyebeam residencies support the creative research, production and presentation of initiatives querying art, technology and culture. The residency is a period of concentration in visionary, experimental applications and projects. It is a chance to use the time, space, and tools at Eyebeam to reach the next stage of your practice. International applicants are welcome to apply, although Eyebeam does not have the resources to provide travel or accommodation. Eyebeam is happy to work with selected applicants, where required, to help them to secure funds to cover these expenses. International Residents are responsible for securing their own visas for the Residency period. Eyebeam is happy to provide necessary paperwork to help expedite the process.
NOTE: International applicants are encouraged to take into consideration the time required for meeting travel and visa requirements and may want to consider applying to the cycle prior to their intended start date.
PARTICIPATION: Residents are expected to fully document their progress and their projects and to participate in public events including workshops, weekly residents/fellows meetings, monthly “Stop Work” critique sessions, demonstrations of work in progress, panel discussions, and online releases, in addition to the Eyebeam Annual Showcase (an annual ten-day event presenting the previous years’ work to the public). The ideal resident will both contribute to and benefit from the shared environment at Eyebeam, and will thrive in the dedication to openness and collaborative process across the organization, including staff, residents and fellows.
All residents will be selected from this open call, based on the quality of the work being proposed, the applicability of Eyebeam’s tools and resources in realizing and supporting the work, and in consideration of the overarching research themes and activities of the organization.
Core to Eyebeam’s methodology is the brokering of relationships between artists, hackers, coders, designers, engineers and other creative technologists in the context of an open and shared culture of investigation and critique. Eyebeam fosters and facilitates relationships whereby technologists and artists come together to germinate and incubate their ideas, develop new processes, and create new works through a period of immersion in a social and professional context which is rich in technology, expertise and ideas.
RESIDENCY FOCUS AREAS: Eyebeam is focusing on two concentration areas this cycle: 1) Mobile/Pervasive Computing and 2) Anonymity & Privacy. Eyebeam is also interested in the overlap between these two areas and is centering this residency cycle around these issues in the hopes that strong new works will be generated leading to a greater awareness of both.
We bring our mobile devices with us everywhere, all the time. This raises many questions, among them: is there a future for art on the phone or the iPad? How does this relate to the internet as a distribution platform? What lines can be drawn between offline vs online creative activity? Of potentially even larger importance is the issue of artistic independence inside channels of distribution and communication tightly controlled by corporate and government interest. This focus area seeks to provoke project proposals that explore this area in myriad ways, aesthetically and practically.
ANONYMITY & PRIVACY
Eyebeam supports artists and technologists who are working at the intersection of anonymity and art-making, with a focus on projects that seek to build awareness around privacy and identity online. What data do we relinquish on a daily basis and who controls it? What is the relationship between openness and control? More and more, social networks and software engineers are convincing web users to share information once considered private thereby creating a climate wherein privacy is generally thought to be equal to selfishness and publicness is de facto equal to public good. In what ways can artists encourage dialogue around this subject matter and what role does anonymity play in actuating online empowerment?
APPLICATION REQUIREMENTS: Applications are only accepted via the online application system (link). Applications received after the deadline of 12:00 (EST) PM (noon), November 26, 2012, will not be accepted. All applications and work samples must be submitted through the online form. No exceptions will be made. You can create a user/password during the application process and log back into the server to update your application before the final deadline.
Applicants must not be currently enrolled in degree-granting academic programs. Individuals and collaborative teams are invited to apply. In either case, please detail in your application how technical and creative responsibilities will be met. If applying as a collaborative team, please include information about team members' relevant prior experience and combine CV’s into a single document before uploading.
Complete applications must include the following information:
• Contact Information
• Resume or CV (.rtf, .pdf, .doc) -- combined into a single document if applying as a collaborative.
• Work samples in the form of URLs. Include a project description with your work sample that explains your contribution to the piece, how it is meant to be viewed and how it relates to your proposed project(s)/research.
• Concise responses to all application questions. Incomplete applications will not be considered.
• Single PDF document containing any visuals (data flow, sketches, timeline, schematics, etc) that will help reviewers understand the proposal.
FAQ for applicants
Statement on Diversity: Eyebeam is committed to building a diverse creative environment and therefore welcomes applications from people of diverse backgrounds. We recognize diversity as encompassing personal style, age, race, gender, ethnicity, sexual orientation, gender identity, language, physical ability, religion, and family.