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In this discussion we will consider how anonymity has shaped our experiences with the internet. It was once a defining characteristic of life online. Until the rise of social media, internet users rarely identified themselves with pictures or real names. The early years of the internet were a singular opportunity to exchange ideas freely without our personal history influencing other people’s expectations of our skills or intellect. The freedom of expression that online anonymity offers can create a safe space for young people to explore their sexuality or complicate other parts of their identity. But more recently, it enables hostile comments on Twitter and other social networks. Spaces like Reddit that sometimes resemble Usenet and chat rooms from years ago also host hateful and unseemly comments . Meanwhile the app Whisper, which promotes itself as an anonymous forum, has come under scrutiny for egregious privacy violations. Some technology commentators are calling for an end to anonymity to curb online bullying. What do we lose as our ability to be truly anonymous online recedes?


Panelists: Seda Gurses, Katherine Cross, Sandra Ordonez

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Image from Foreign Policy magazine.

Eyebeam is pleased that alumni Laurel Ptak and Michael Mandiberg were honored as two 100 Leading Global Thinkers of 2014. These individuals, as well as their collaborators Siân Evans, Richard Knipel, Dorothy Howard and Jacqueline Mabey share the title alongside names such as Kara Walker and Angela Merkel. Under the category of “Chroniclers”, the magazine commended their “Art + Feminism Wikipedia Edit-a-thon” which took place in February as part of an ongoing commitment to address issues related to gender and technology at Eyebeam. The edit-a-thon sought to close the gender gap in Wikipedia’s editing community through a collective mass edit of the website’s content coordinated with 30 other venues internationally. To this day, many similar events have taken place training young activist-editors for future projects. A follow-up 2015 Art+Feminism Wikipedia Edit-a-thon will be held in NYC on Saturday, March 7th at MoMA, full details at: art.plusfeminism.org.

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RESIDENCY BEGINS: April 2015 AND RUNS THROUGH July 2015 (3 MONTHS) 

APPLICATION DEADLINE: January 10, 2015 at 12PM (noon), EST. Applicants will be informed of their application status by February 1, 2015.  

TASML and Eyebeam are pleased to announce a new prize for emerging Chinese media artists under the age of 35, including those living outside China. Titled TASML | Carroll / Fletcher@Eyebeam: Young Chinese Artist Talent Award, the prize is generously sponsored by the London based Carroll Fletcher Gallery and Eyebeam. An international jury will convene to select the winning artist who demonstrates excellence of past works and future promise. The award money of US$8000 will support the selected artist for a three-month residency at Eyebeam in New York City. TASML and Eyebeam, in collaboration with Carroll / Fletcher Gallery, will organize receptions and presentations to introduce the awardee to the New York art community. Carroll / Fletcher Gallery will showcase the results of these residencies for the awarded artists in its London space over the two-year cycle of the award.   

Eyebeam is currently supporting initiatives within the theme of “Techne!”, as outlined below. In order to bring together artists working in similar trajectories, the application for the TASML | Carroll / Fletcher@Eyebeam: Young Chinese Artist Talent Award encourages proposals on this theme, but does not require it. Evidence of compelling past works will be critical in the selection process.

Full info. here. 

申请截止日期 2015年1月10日(北京时间)晨0时,(纽约时间)午12时, 获奖结果将于2015年2月1日公布; 驻留日期: 2015年4月 - 2015年 7月 ( 3个月)。

TASML 及 Eyebeam 公布为35岁(含)以下的青年中国媒体艺术家(包括居住于海外)所设立的一则新奖项: TASML | Carroll / Fletcher@Eyebeam: 青年艺术家人材奖。本奖项得到伦敦 Carroll Fletcher 画廊及纽约艺术与技术中心Eyebeam 慷慨支持。获奖艺术家将由国际评委选出, 获奖者将以过往的优秀作品及未来的发展潜力为考量。总额为8000 美元(人民币48575,税前)的奖金将用来支付获奖艺术家在纽约Eyebeam 3个月的驻留费用. TASML  Eyebeam, 将与 Carroll / Fletcher 画廊合作, 为获奖艺术家在纽约驻留期间安排媒体招待会及其他宣传推广活动, 在此奖项两年期满之时,Carroll / Fletcher 画廊还将为历届获奖者在其于伦敦的画廊举办成果展。参选者需可以用英语交流, 申请将在Eyebeam网上进行,所有申请材料均以英语为使用语言。有关本奖项的具体内容以及具体申请流程请登录Eyebeam 网站并按照要求提供,材料不全者将不予以考虑。

 

RESIDENCY BEGINS: April 2015 AND RUNS THROUGH July 2015 (3 MONTHS) 

APPLICATION DEADLINE: January 10, 2015 at 12PM (noon), EST. Applicants will be informed of their application status by February 1, 2015.  

TASML and Eyebeam are pleased to announce a new prize for emerging Chinese media artists under the age of 35, including those living outside China. Titled TASML | Carroll / Fletcher@Eyebeam: Young Chinese Artist Talent Award, the prize is generously sponsored by the London based Carroll Fletcher Gallery and Eyebeam. An international jury will convene to select the winning artist who demonstrates excellence of past works and future promise. The award money of US$8000 will support the selected artist for a three-month residency at Eyebeam in New York City. TASML and Eyebeam, in collaboration with Carroll / Fletcher Gallery, will organize receptions and presentations to introduce the awardee to the New York art community. Carroll / Fletcher Gallery will showcase the results of these residencies for the awarded artists in its London space over the two-year cycle of the award.  

Eyebeam is currently supporting initiatives within the theme of “Techne!”, as outlined below. In order to bring together artists working in similar trajectories, the application for the TASML | Carroll / Fletcher@Eyebeam: Young Chinese Artist Talent Award encourages proposals on this theme, but does not require it. Evidence of compelling past works will be critical in the selection process. 

TECHNE!

In light of tectonic shifts in the overlap between art, culture and technology in recent years, Eyebeam is throwing open its Residency program to a single invocation - Techne! This focus is also the theme of Eyebeam’s current residency call. 

The term techne, for the Greeks, was inclusive of the arts as well as craftsmanship and engineering. Now, the chasm between art and technology is narrowing, with the boundaries between arts, craft, and aesthetics blending in exciting new ways, largely due to high-tech/low-cost computation and more pervasive internet access.

We are asking you — artists, digital creators, engineers, creative technologists, researchers and cultural producers — to join us in creating provocative work that helps realign the arts to the machinic. As devices become further extensions of the body, in a time when advertisements are tailored to hyper-specific, localized desires and privacy is nearly a luxury product, artistic practice is more important than ever in influencing the cultural trajectory. This residency cycle Eyebeam is looking to support new work that is deeply examining artistic creation in relation to emergent technology, in various forms, and will consider all proposals, especially those that have positive real-world impact. 

APPLICATION REQUIREMENTS: Applications are only accepted via the online application system (link). Applications received after the deadline of 12:00 (EST) PM (noon), December 21, 2014 EST will not be accepted. All applications and work samples must be submitted through the online form. No exceptions will be made. You can create a user/password during the application process and log back into the server to update your application before the final deadline. 

Complete applications must include the following information:

 • Contact Information (Collaborative teams are invited to apply but application must clearly state how technical and creative responsibilities will be met in the team).

• Resume or CV (.rtf, .pdf, .doc) -- combined into a single document if applying as a collaborative.

• Work samples in the form of URLs. Include a project description with your work sample that explains your contribution to the piece, how it is meant to be viewed and how it relates to your proposed project(s)/research.

• Concise responses to all application questions. Incomplete applications will not be considered.

• Single PDF document containing any visuals (including timeline with milestones, and additional information such as data flow, sketches, schematics) that will help reviewers understand the proposal.

APPLY HERE

申请截止日期 2015年1月10日(北京时间)晨0时,(纽约时间)午12时, 获奖结果将于2015年2月1日公布; 驻留日期: 2015年4月 - 2015年 7月 ( 3个月)。

TASML 及 Eyebeam 公布为35岁(含)以下的青年中国媒体艺术家(包括居住于海外)所设立的一则新奖项: TASML | Carroll / Fletcher@Eyebeam: 青年艺术家人材奖。本奖项得到伦敦 Carroll Fletcher 画廊及纽约艺术与技术中心Eyebeam 慷慨支持。获奖艺术家将由国际评委选出, 获奖者将以过往的优秀作品及未来的发展潜力为考量。总额为8000 美元(人民币48575,税前)的奖金将用来支付获奖艺术家在纽约Eyebeam 3个月的驻留费用. TASML  Eyebeam, 将与 Carroll / Fletcher 画廊合作, 为获奖艺术家在纽约驻留期间安排媒体招待会及其他宣传推广活动, 在此奖项两年期满之时,Carroll / Fletcher 画廊还将为历届获奖者在其于伦敦的画廊举办成果展。参选者需可以用英语交流, 申请将在Eyebeam网上进行,所有申请材料均以英语为使用语言。有关本奖项的具体内容以及具体申请流程请登录Eyebeam 网站并按照要求提供,材料不全者将不予以考虑。

TASML | Tsinghua University Art and Science Media Laboratory is a research laboratory that aims to synergize the rich resources available among the Tsinghua's diverse research facilities and laboratories to create an incubator for crossbred, interdisciplinary experiments among artists, designers, scientists and technologists. TASML also functions as a center and a hub for worldwide exchange and collaboration both with academic and the global media art and design community. 

Eyebeam is a nonprofit exhibition space, artist colony, and R&D lab that supports dynamic and risk-taking work at the intersection of art and technology. For over sixteen years, Eyebeam has been dedicated to exposing audiences to experimental and interdisciplinary work, providing an environment for dialogue, collaboration, and discovery. For more information on Eyebeam http://eyebeam.org

Carroll / Fletcher Gallery Co-founded by Jonathon Carroll and Steve Fletcher, Carroll / Fletcher is a contemporary art gallery located on Eastcastle Street in Central London. The gallery supports existing and new forms of artistic production, and works with exceptional emerging and established artists, whose practices use a diverse range of media to explore contemporary socio-political, cultural, scientific and technological themes. Carroll / Fletcher showcases developments in visual culture by commissioning and exhibiting ambitious new works. It collaborates with museums and other non-commercial institutions to develop interest in, and long-term critical appreciation of the work of its artists. The gallery also presents curated group shows, occasional location specific works and collaborative education projects.

For more information about Carrol Fletcher Gallery http://www.carrollfletcher.com

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In this discussion we will review the dynamics and patterns of online abuse on social networks. How does a minor scuffle so quickly become an avalanche of online harassment? Why are women, people of color, and the queer and trans community disproportionately targeted? What are steps we can take to build safe spaces on the internet? A killfile or block button is no longer a sufficient tool to prevent abuse and the common advice “don’t feed the troll” ignores the contemporary climate of online abuse. We will discuss tactics to minimize online abuse and the potential for structural change.

Panelists: Erin Kissane, Sydette Harry and Melissa Gira Grant 

Space is limited so please RSVP here.

Doors: 7:00PM

Panel begins: 7:30PM

Archived here: https://soundcloud.com/eyebeamnyc/new-topics-in-social-computing-online-abuser-dynamics

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In light of tectonic shifts in the overlap between art, culture and technology in recent years, Eyebeam is throwing open its Residency program to a single invocation - Techne! 

Techne, for the Greeks, was inclusive of the arts as well as craftsmanship and engineering. Now, the chasm between art and technology is narrowing, with boundaries between arts, craft, and aesthetics blending in exciting new ways, largely due to high-tech/low-cost computation. For seventeen years, Eyebeam has been at the forefront of bringing these worlds together and with this residency Eyebeam again looks to support practitioners who agree that the most interesting and visionary work need not be hemmed in by genre or medium but can flourish through technological savvy. 

We are asking you — artists, digital creators, engineers, creative technologists, researchers and cultural producers — to join us in creating provocative work that helps realign the arts to the mechanic. Eyebeam will grant up to $5,000 to each selected residency project, either to a single individual or a collaboration of two or more artists.

FULL CALL HERE

APPLICATION DEADLINE: November 21, 2014 at 12PM (noon). Applicants will be informed of their application status by February 3, 2015.  

In light of tectonic shifts in the overlap between art, culture and technology in recent years, Eyebeam is throwing open its Residency program to a single invocation - Techne! 

Techne, for the Greeks, was inclusive of the arts as well as craftsmanship and engineering. Now, the chasm between art and technology is narrowing, with boundaries between arts, craft, and aesthetics blending in exciting new ways, largely due to high-tech/low-cost computation. For seventeen years, Eyebeam has been at the forefront of bringing these worlds together and with this residency Eyebeam again looks to support practitioners who agree that the most interesting and visionary work need not be hemmed in by genre or medium but can flourish through technological savvy. 

We are asking you — artists, digital creators, engineers, creative technologists, researchers and cultural producers — to join us in creating provocative work that helps realign the arts to the mechanic. As devices become further extensions of the body, in a time when advertisements are tailored to hyper-specific, localized desires and privacy is nearly a luxury product, artistic practice is more important than ever in influencing the cultural trajectory. This residency cycle Eyebeam is looking to support new work that is deeply examining artistic creation in relation to emergent technology in various forms, and will consider all proposals, especially those that are provocative and have positive real-world impact. 

Eyebeam will grant up to $5,000 to each selected residency project, either to a single individual or a collaboration of two or more artists. The incoming number of residents will be determined by the quality of applications and available funding. 

Residents will be selected to join continuing residents and fellows for an upcoming 5-month cycle, ideally beginning in mid-March, 2015 but potentially later. If a different start date is preferable, please indicate that on your application inside the "additional information" section. 

EYEBEAM VALUES: Eyebeam’s core values include a critical questioning of the status quo and a belief in risk-taking as an essential element to achieve progress. This has been demonstrated through seventeen years of experimentation via creative use and misuse of technology. This approach has resulted in the development of creative platforms, tools and exciting works of art. 

SUPPORT: The 5-month residency is a period of concentrated work on a visionary, experimental project. It is a chance to use the time, space, community, and tools at Eyebeam to reach the next stage of one’s practice.

Eyebeam will work closely with the artists and technologists to see their projects realized, including acting as a facilitator to coordinate organizational partnerships.

NOTE: International applicants are welcome to apply, although Eyebeam unfortunately does not have the resources to provide travel or accommodation. Eyebeam is happy to work with selected applicants, where required, to help them to secure funds to cover these expenses. International Residents are responsible for securing their own visas for the residency period. Eyebeam is happy to provide necessary paperwork to help expedite the process.

RESIDENCY BEGINS: MARCH 2015 AND RUNS THROUGH JULY 2015 (5 MONTHS

APPLICATION REQUIREMENTS: Applications are only accepted via the online application system (link). Applications received after the deadline of 12:00 (EST) PM (noon), November 21, 2014 EST will not be accepted. All applications and work samples must be submitted through the online form. No exceptions will be made. You can create a user/password during the application process and log back into the server to update your application before the final deadline.

All Residents will be selected from this open call, based on the quality of the work being proposed, the applicability of Eyebeam's tools and resources in realizing and supporting the work, and the proposed project’s relation to the overarching research themes and activities of the organization. Collaborative applications are accepted. 

Complete applications must include the following information:

 • Contact Information (Collaborative teams must clearly state how technical and creative responsibilities will be met in the team).

 • Resume or CV (.rtf, .pdf, .doc) -- combined into a single document if applying as a collaborative.

 • Work samples in the form of URLs. Include a project description with your work sample that explains your contribution to the piece, how it is meant to be viewed and how it relates to your proposed project(s)/research.

 • Concise responses to all application questions. Incomplete applications will not be considered.

 • Single PDF document containing any visuals (including timeline with milestones, and additional information such as data flow, sketches, schematics) that will help reviewers understand the proposal.

For further info., please read our Residency FAQ

APPLY HERE

 ______
Eyebeam is a nonprofit exhibition space, artist colony, and R&D lab that supports dynamic and risk-taking work at the intersection of art and technology. For seventeen years, Eyebeam has been dedicated to exposing audiences to experimental and interdisciplinary work, providing an environment for dialogue, collaboration, and discovery.

 

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Planning, creating and managing digital archives, catalogs, and collections is a growing concern as organizations seek to manage files and records, metadata-gather, and enable complex searches of their cultural production, ephemera, archives and/or born-digital assets.

This two-part workshop teaches popular open-source digital archiving and collections management packages. Learn to select, install and perform basic configuration on Omeka, used primarily in academic and digital humanities projects; and CollectiveAccess, used primarily in GLAM [Galleries, Libraries, Archives, Museums] projects.

The first half of the workshop will teach you what to expect and consider in a planning a cataloging software project; orient you to use cases and a general review of how digital cataloging softwares are implemented, and includes an overview of features, metadata schemas, and problems to look out for.

The second half dives deeper into a hands-on comparison of two specific programs, and participants will have an opportunity to build [and break!] from either their own servers or a temporary web interface and command-line access Openflows provides. We want to help you build what’s most useful to you! FYI we can’t provide server support in the workshop.

Register Here!

ABOUT THE INSTRUCTOR

Hadassah Damien is a technologist, catalog software developer, and digital communications specialist at Openflows. As a community organizer who also implements technology to help activists succeed, and a multimedia artist who also builds digital archives, her work intersects functionality with agility, practicality, and the democratic politics of open-source cultures. She has collaborated on digital collection sites for John Jay library, The Interference Archive, and more. She holds an MA in American Studies, and a Certificate in Interactive Technology and Pedagogy from the CUNY Graduate Center.

Openflows Community Technology Lab is a NYC-based worker cooperative committed to bringing collaborative and cutting edge open source software [FLOSS] solutions to non-profit organizations, NGOs, libraries, progressive community organizations, and more. Since 2003 we have specialized in planning, configuration, and customization of FLOSS for large and small organizations worldwide.

SCHEDULE

Part A -- 6:30-8:00: Theory, digital catalog/archive project overview

Break -- 8:00-8:30

Part B -- 8:30-10:30: Hands-on learning, technical interfacing, back-end

TECHNICAL SPECIFICATIONS

The first half of the workshop is geared to participants of all technical backgrounds.

The second half is geared to those comfortable with some web-building. If you are okay using WordPress, you'll be okay at this section.

Please bring a computer or be comfortable using a station at Eyebeam, as we will be learning by making.

If you bring your own machine, ensure you have:
-- a command-line tool if you plan to try a CLI install OR an FTP client [try Cyberduck if you don’t have one] if you don’t want to use the command line
-- an HTML editor [try TextWrangler if you don't have one],
-- and a few images to load into the systems to test it out.

You may also proceed in the class by loading the software onto your own server. In this case, you’ll need to come with the following additional preparations:
-- your login and password to the server
-- two databases created, and the usernames and passwords for those

REFERENCE URLs

Software List: http://www.femmetech.org/2014/10/digital-archiving-software-1/

CollectiveAccess: http://www.collectiveaccess.org/about/roadmap

Omeka: http://omeka.org/

Register Here!

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The Queer  Art and Technologies (QUAT) research group is a collective of artists,  curators, writers, and academics who are interested in exploring the intersection of art and technology while questioning technology's heteronormativity and gender bias through monthly discussions, talks, lectures, and public exhibitions.
http://ghostridethebody.tumblr.com/
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Arjun Srivatsa is Eyebeam's first ever Best Boy!!!! Some of his previous projects include Net Artist Daily, the American Medium Sound Series and the Solo Jazz Cup meme. He currently lives under blankets. ¯\_(ツ)_/¯